Molybdenum disilicide (MoSi2) is an intermetallic compound of molybdenum and silicon that belongs to the transition metal silicide group. It is widely studied for its high-temperature stability and its ability to form a protective silica layer that resists oxidation. As a sputtering target, MoSi2 is a dense solid source material used in physical vapor deposition to produce thin films for research and development work.
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- Deposition of high-temperature protective and oxidation-resistant thin films
- Diffusion barrier and contact layer studies in microelectronics research
- Development of silicide-based coatings for demanding thermal environments
- Fundamental materials research on transition metal silicide thin films
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