This molybdenum disilicide (MoSi2) sputtering target from Nanografi is a 99.95% purity disc measuring 4'' in size and 0.250'' in thickness. It serves as the source material in sputter deposition systems, where atoms are eroded from the target and deposited as a thin film onto a substrate such as a silicon wafer.
Sputtering can coat substrates of many shapes and sizes, and results are repeatable. A process developed at small research and development scale can be carried over to production batches covering medium to large substrate areas. Depending on the process parameters, chemical reactions may take place on the target surface, in flight or on the substrate itself.
Although the number of adjustable parameters makes sputter deposition a complex technique, it gives experienced users close control over film growth and microstructure.
- Deposition of thin films onto substrates such as silicon wafers.
- Sputter etching where high etching anisotropy is required and selectivity is not a concern.
- Material analysis by etching away the target, as in secondary ion mass spectroscopy (SIMS), to determine composition and detect very low impurity concentrations.
- Studies related to space weathering, the sputtering process that alters airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.95% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01MO30
- Material: Molybdenum Disilicide (MoSi2)
- Size: 4''
- Thickness: 0.250''
- Product code: NG0ST01MO30
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