This molybdenum disulfide (MoS2) sputtering target from Nanografi is an indium-type target with 99.9% purity, supplied as a 1'' disc with a thickness of 0.125''. It serves as the source material for depositing MoS2 thin films by sputtering.
Sputter deposition can coat thin films onto substrates of many shapes and sizes. The process is repeatable, works for small research and development projects, and can be scaled up to production batches covering medium to large substrate areas.
Depending on the process parameters, chemical reactions may take place on the target surface, in flight or on the substrate. The large number of adjustable parameters makes sputtering a complex technique, but it gives experienced users considerable control over film growth and microstructure.
- Thin film deposition, eroding material from the target onto a substrate such as a silicon wafer.
- Sputter etching where a high degree of etching anisotropy is required and selectivity is not a concern.
- Material analysis by etching, such as secondary ion mass spectrometry (SIMS), where sputtered atoms are identified to determine composition and detect very low impurity levels.
- Studies related to space weathering, a sputtering process that alters airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.9% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01MO44
- Material: Molybdenum Disulfide (MoS2)
- Type: Indium
- Size: 1''
- Thickness: 0.125''
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