Molybdenum disulfide (MoS2) sputtering targets are solid source materials used in physical vapor deposition (PVD) to produce thin films of MoS2. MoS2 belongs to the transition metal dichalcogenide (TMD) family, a group of layered materials whose weakly bonded layers give them lubricating, semiconducting, and catalytic behavior. Because MoS2 films are sensitive to deposition parameters, careful target handling and process control are important for reproducible results. These targets support controlled deposition of uniform films onto substrates for laboratory and pilot-scale work.
- Quantity: 1 piece
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- Solid lubricant coatings for tribology research
- Two-dimensional materials and thin-film semiconductor studies
- Optoelectronic and photodetector device prototyping
- Catalyst layer development for hydrogen evolution studies
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