This molybdenum (Mo) sputtering target from Nanografi is a source material for thin film deposition. It has a purity of 99.95%, a size of 2'' and a thickness of 0.250'', and is supplied as a single piece.
In sputter deposition, material is eroded from the target and deposited as a thin film onto a substrate such as a silicon wafer. The technique works with substrates of many shapes and sizes, gives repeatable results, and scales from small research and development work up to production batches covering medium to large substrate areas.
Depending on the process parameters, chemical reactions can take place on the target surface, in flight or on the substrate. The large number of adjustable parameters makes sputtering a complex process, but it also gives experienced users considerable control over film growth and microstructure.
- Deposition of thin molybdenum films onto substrates such as silicon wafers.
- Sputter etching where high etching anisotropy is required and selectivity is not a concern.
- Analytical work such as secondary ion mass spectrometry (SIMS), where sputtered atoms are identified and quantified to determine composition and trace impurities.
- Research into space weathering processes that alter airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.95% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01MO04
- Material: Molybdenum (Mo)
- Size: 2''
- Thickness: 0.250''
- Product code: NG0ST01MO04
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