This Molybdenum (Mo) sputtering target from Nanografi has a purity of 99.95%, a size of 3'' and a thickness of 0.125''. It is supplied as a single piece and serves as the source material for depositing molybdenum thin films by sputtering.
In sputter deposition, material is eroded from the target and deposited onto a substrate such as a silicon wafer. The method handles a wide range of substrate shapes and sizes, gives repeatable results, and can move from small R&D work to production batches covering medium to large substrate areas.
Depending on process settings, chemical reactions may take place at the target surface, in flight or on the substrate. The number of adjustable parameters makes sputtering demanding, but it gives experienced users close control over film growth and microstructure.
- Deposition of molybdenum thin films onto substrates such as silicon wafers.
- Sputter etching where high etching anisotropy is required and selectivity is not a concern.
- Material analysis by etching, for example in secondary ion mass spectrometry (SIMS) to determine composition and detect trace impurities.
- Scaling thin film processes from research projects to medium and large area production batches.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.95% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01MO05
- Material: Molybdenum (Mo)
- Size: 3''
- Thickness: 0.125''
- Product code: NG0ST01MO05
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