This Nanografi molybdenum (Mo) sputtering target is a 99.95% purity disc measuring 6'' in size with a thickness of 0.125''. It serves as the source material in sputter deposition systems, where atoms are eroded from the target and deposited as a thin film onto a substrate such as a silicon wafer.
Sputtering is an established deposition technique that works with many materials and with substrates of varied shape and size. The process is repeatable and scales from small research and development work up to production batches covering medium to large substrate areas.
Depending on process settings, chemical reactions may take place at the target surface, in flight or at the substrate. The number of adjustable parameters makes sputtering demanding, but it gives experienced users fine control over film growth and microstructure.
- Thin film deposition of molybdenum onto substrates such as silicon wafers.
- Sputter etching where high etching anisotropy is required and selectivity is not a concern.
- Material analysis by etching, for example in secondary ion mass spectrometry (SIMS) to determine composition and detect very low impurity levels.
- Research related to space weathering, in which sputtering alters the surfaces of airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.95% |
| Category | — |
| Pack sizes | — |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01MO09
- Material: Molybdenum (Mo)
- Size: 6''
- Thickness: 0.125''
- Product code: NG0ST01MO09
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