This molybdenum (Mo) sputtering target is a 99.95% pure source material for depositing thin films by sputtering. It measures 8'' in size with a thickness of 0.250'' and is supplied as a single piece.
In sputter deposition, material is eroded from the target and carried onto a substrate such as a silicon wafer. The method works on substrates of many shapes and sizes, gives repeatable results, and scales from small research projects to production batches covering medium to large substrate areas.
Depending on process parameters, chemical reactions can take place at the target surface, in flight or at the substrate. The large number of adjustable parameters makes the process complex, but it gives experienced users considerable control over film growth and microstructure.
- Thin film deposition of molybdenum onto substrates such as silicon wafers.
- Sputter etching where high etching anisotropy is required and selectivity is not a concern.
- Material analysis by sputtering, as in secondary ion mass spectrometry (SIMS), to determine composition and detect very low impurity levels.
- Research related to space weathering processes on airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.95% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01MO12
- Material: Molybdenum (Mo)
- Size: 8''
- Thickness: 0.250''
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