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Molybdenum Oxide (MoO3) Sputtering Targets, indium

Molybdenum Oxide (MoO3) Sputtering Targets, indium
Regular price Rp 34.908.000,00
Regular price Sale price Rp 34.908.000,00
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Molybdenum oxide (MoO3) sputtering targets are solid, sputter-deposition source materials made from molybdenum trioxide, a transition metal oxide. They are used in physical vapor deposition (PVD) to form thin films on substrates for research and development. Molybdenum oxide is widely studied for its redox behavior and its electronic and optical properties, which makes it a common material in thin-film and device research.

  • Quantity: 1 piece

For technical specifications, Certificate of Analysis (CoA), or quotation, please contact AMI Scientific.

  • Thin-film deposition for optoelectronic and electronic device research
  • Hole-injection or charge-transport layers in organic and perovskite device studies
  • Electrochromic and smart-window coating development
  • Gas sensor film fabrication and surface studies
  • Catalysis and surface chemistry research on oxide thin films

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