Molybdenum Oxide (MoO3) sputtering targets are ceramic source materials used in physical vapor deposition (PVD) to produce thin films of molybdenum oxide. MoO3 belongs to the transition metal oxide group, valued in materials research for its semiconducting and redox-active properties. These targets are supplied as nanomaterial-based sputtering sources for laboratory-scale thin-film work.
- Quantity: 1 piece
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- Deposition of thin films for electrochromic and smart-window research
- Fabrication of gas sensing layers for metal oxide sensor studies
- Development of thin-film electronic and optoelectronic components
- Preparation of functional oxide coatings for energy storage and catalysis research
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