This molybdenum oxide (MoO3) sputtering target from Nanografi is a 4'' target with a thickness of 0.250'' and a purity of 99.9%. It serves as the source material in sputter deposition, where material is eroded from the target and deposited as a thin film onto a substrate such as a silicon wafer.
Sputtering is an established route for coating substrates of many shapes and sizes. The process is repeatable and scales from small research and development work up to production batches covering medium to large substrate areas. Depending on the process parameters, chemical reactions may take place at the target surface, in flight or on the substrate.
Because sputter deposition involves many adjustable parameters, it is a complex process, but it gives experienced users a high level of control over film growth and microstructure. Each order supplies one piece.
- Deposition of thin films onto substrates such as silicon wafers by sputtering.
- Sputter etching where strong etching anisotropy is required and selectivity is not a concern.
- Material analysis by sputtering, as in secondary ion mass spectrometry (SIMS), to determine composition and detect very low impurity levels.
- Research and development projects that may later be scaled up to medium or large substrate areas.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.9% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01MO55
- Material: Molybdenum Oxide (MoO3)
- Size: 4''
- Thickness: 0.250''
- Product code: NG0ST01MO55
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