This nickel chromium (Ni-Cr) sputtering target from Nanografi is a 1'' disc with a thickness of 0.250'' and a purity of 99.9%. It serves as the source material in sputter deposition systems, where atoms are eroded from the target and deposited as a thin film on a substrate such as a silicon wafer.
Sputtering is an established technique for coating substrates of many shapes and sizes with thin films. The process is repeatable, works for small research and development runs, and can be scaled to production batches covering medium to large substrate areas.
Depending on the process parameters, chemical reactions may take place at the target surface, during transport, or on the substrate. The number of adjustable parameters makes sputter deposition complex, but it gives experienced users fine control over film growth and microstructure.
- Thin film deposition onto substrates such as silicon wafers.
- Sputter etching where highly anisotropic etching is required and selectivity is not critical.
- Material analysis by sputtering, as in secondary ion mass spectrometry (SIMS), to determine composition and detect trace impurities.
- Research and development work that may later be scaled up to production batches.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.9% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01NI36
- Material: Nickel Chromium (Ni-Cr)
- Size: 1''
- Thickness: 0.250''
- Product code: NG0ST01NI36
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