Nickel chromium (Ni-Cr) sputtering targets are metal alloy target materials composed of nickel and chromium. They serve as the source material in physical vapor deposition (PVD) processes, such as DC or RF magnetron sputtering, to deposit thin metallic films onto substrates for research and industrial use.
- Quantity: 1 piece
For technical specifications, CoA, or quotation, please contact AMI Scientific.
- Thin-film resistor fabrication in microelectronics research
- Adhesion and barrier layers in thin-film metallization
- Corrosion-resistant and protective coatings studies
- Decorative and functional metal coatings development
| Brand | — |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | — |
| Category | — |
| Pack sizes | — |
| Physical form | — |
| Storage | — |
—
—