Nickel chromium (Ni-Cr) sputtering targets are solid metallic alloy sources made from a combination of nickel and chromium, designed for physical vapor deposition (PVD) processes. During sputtering, energetic ions bombard the target surface, ejecting atoms that condense onto a substrate to form a thin alloy film. Ni-Cr alloys belong to the class of engineering metal alloys valued for their stability and resistance to oxidation.
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- Thin-film resistor fabrication for electronic circuits
- Corrosion- and oxidation-resistant protective coatings
- Resistive thin films for heating elements in research devices
- Adhesion or seed layers in multilayer thin-film stacks
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