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Nickel Chromium (Ni-Cr) Sputtering Targets

Nickel Chromium (Ni-Cr) Sputtering Targets
Regular price Rp 18.226.000,00
Regular price Sale price Rp 18.226.000,00
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Nickel chromium (Ni-Cr) sputtering targets are solid alloy sources made from nickel and chromium, used in physical vapor deposition (PVD) processes such as magnetron sputtering. Ni-Cr is a metallic alloy class known for its corrosion resistance and stable electrical behavior. During sputtering, the target is bombarded with energetic ions, which eject atoms that condense onto a substrate to form a thin film.

  • Quantity: 1 piece

For technical specifications, CoA, or quotations, please contact AMI Scientific.

  • Thin-film resistors and resistive layers in electronic research
  • Corrosion-resistant metallic coatings on test substrates
  • Adhesion or buffer layers in multilayer thin-film stacks
  • Decorative and functional metallic coatings studies

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