Nickel chromium (Ni-Cr) sputtering targets are solid metallic alloy plates of nickel and chromium used as the source material in physical vapor deposition (PVD) sputtering. During sputtering, energetic ions bombard the target surface and eject atoms that condense on a substrate to form a thin alloy film. As a nickel-based alloy, Ni-Cr is widely studied for its combination of metallic conductivity and resistance to oxidation.
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- Thin-film resistors and resistive layers in microelectronics research
- Heating element films for experimental thermal devices
- Protective and corrosion-resistant metallic coatings
- Adhesion and barrier layers in multilayer thin-film stacks
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