Nickel Chromium (Ni-Cr) sputtering targets are metallic alloy targets used in physical vapor deposition (PVD) to produce thin films. Nickel-chromium alloys belong to the group of engineering alloys valued for their corrosion resistance, stable electrical behavior, and good adhesion to many substrates. In sputtering, the target material is bombarded with ions so that its atoms are ejected and deposited onto a substrate as a uniform layer.
- Quantity: 1 piece
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- Thin-film resistor layers in electronic component research
- Adhesion or buffer layers in multilayer thin-film stacks
- Protective and corrosion-resistant coatings on laboratory samples
- Metallization studies for microelectronics and sensor development
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