Nickel Chromium (Ni-Cr) sputtering targets are solid metal alloy sources used in physical vapor deposition (PVD). During sputtering, energetic ions bombard the target surface and eject atoms that condense onto a substrate, forming a thin film with controlled composition. Ni-Cr is an alloy of nickel and chromium, valued for its resistive and corrosion-resistant properties in thin-film form.
- Quantity: 1 piece
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- Thin-film resistor layers for electronic and sensor prototyping
- Metallic contact and adhesion layers in microelectronic device fabrication
- Diffusion barrier and protective coatings in materials research
- Surface engineering studies on alloy thin films
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