Nickel chromium (Ni-Cr) sputtering targets are solid metal alloy sources used in physical vapor deposition (PVD) to deposit thin films onto substrates. As a nickel-chromium alloy, this material belongs to the family of engineered metal alloys, known for combining corrosion resistance with stable electrical behavior in thin-film form.
- 1 piece
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- Thin-film resistor fabrication research
- Protective and corrosion-resistant coating studies
- Metallization research for electronic and microelectronic devices
- PVD process development and sputtering parameter optimization
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