Nickel-iron (Ni-Fe) sputtering targets are solid, metallic alloy sources used in physical vapor deposition (PVD) to form nickel-iron thin films. As alloy-based thin-film source materials, they are mounted in sputtering systems, where energetic ions erode the target surface and deposit the material onto a substrate.
- Quantity: 1 piece
For technical specifications, certificates of analysis (CoA), or quotations, please contact AMI Scientific.
- Magnetic thin-film research for recording media and spintronic devices
- Soft magnetic coating development for magnetic sensors and MEMS
- Seed or adhesion layer studies in microelectronics and interconnect research
- Coating investigations for electromagnetic shielding
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