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Nickel Iron (Ni-Fe) Sputtering Targets

Nickel Iron (Ni-Fe) Sputtering Targets
Regular price Rp 7.273.000,00
Regular price Sale price Rp 7.273.000,00
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Nickel Iron (Ni-Fe) sputtering targets are solid source plates made from a nickel-iron alloy, a metallic material in the magnetic alloy group. In physical vapor deposition (PVD), the target is bombarded with energetic ions in a vacuum chamber, which ejects atoms that condense onto a substrate to form a thin film.

  • 1 piece

Contact AMI Scientific for technical specifications, CoA, or a quotation.

  • Deposition of soft magnetic thin films for magnetic sensor research
  • Seed and adhesion layers in thin-film device fabrication
  • Magnetic layer studies for spintronics and magnetic recording research
  • Conductive and electromagnetic shielding coatings in laboratory prototypes

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