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Nickel Iron (Ni-Fe) Sputtering Targets

Nickel Iron (Ni-Fe) Sputtering Targets
Regular price Rp 9.402.000,00
Regular price Sale price Rp 9.402.000,00
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Nickel Iron (Ni-Fe) sputtering targets are solid metallic alloy plates used as source material in physical vapor deposition (PVD), particularly magnetron sputtering. During deposition, energetic ions strike the target surface and eject atoms that condense onto a substrate to form thin films. Ni-Fe alloys belong to the family of soft magnetic metal materials, which makes this target type relevant for depositing functional metallic layers in research settings.

  • Quantity: 1 piece

For technical specifications, Certificate of Analysis (CoA), or quotations, please contact AMI Scientific.

  • Deposition of magnetic thin films for magnetic sensor and recording research
  • Fabrication of spintronic and magnetoresistive device prototypes
  • Development of conductive and magnetic metal layers for electronic test structures
  • Academic and industrial coating studies on metallic alloy thin films

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