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Nickel Iron (Ni-Fe) Sputtering Targets

Nickel Iron (Ni-Fe) Sputtering Targets
Regular price Rp 10.176.000,00
Regular price Sale price Rp 10.176.000,00
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Nickel iron (Ni-Fe) sputtering targets are solid sources of nickel-iron alloy used in physical vapor deposition (PVD). During sputtering, energetic ions bombard the target surface and eject alloy atoms that condense onto a substrate to form a uniform thin film. Ni-Fe is a soft magnetic metal alloy, a family of materials widely studied for its magnetic response, which makes these targets a common choice for thin-film research.

  • 1 piece

For technical specifications, certificate of analysis (CoA), or a quotation, please contact AMI Scientific.

  • Soft magnetic thin films for magnetic sensor and device research
  • Magnetic recording and spintronics layer studies
  • Seed or adhesion layers in thin-film metallization
  • Coating studies for microelectronics and MEMS fabrication

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