Nickel iron (Ni-Fe) sputtering targets are solid metallic alloy sources used in physical vapor deposition (PVD) to form thin films. Nickel-iron alloys belong to the soft magnetic metal alloy group, and sputtering targets of this type are commonly used for research on magnetic and conductive thin layers. During sputtering, ion bombardment erodes the target surface in a vacuum chamber, releasing atoms that condense onto a substrate.
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- Deposition of soft magnetic thin films for magnetic sensor and read-head research
- Seed and adhesion layers in thin-film electronic device prototyping
- Magnetic shielding and inductor coating studies
- Investigation of magnetic thin-film behavior and alloy composition effects
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