Skip to product information
1 of 1

Nanografi

Nickel (Ni) Sputtering Targets

Nickel (Ni) Sputtering Targets
Regular price Rp 4.951.000,00
Regular price Sale price Rp 4.951.000,00
Sale Sold out
Shipping calculated at checkout.
Quantity
Quantity
Pembayaran hanya melalui request quotation dan dilakukan setelah tim kami menghubungi Anda. Mohon cantumkan nomor WhatsApp aktif untuk konfirmasi pesanan & pembuatan invoice. Estimasi pengiriman 1-2 bulan setelah pembayaran. Jika belum ada respons, hubungi +62 823-2282-4346.

View full details

Nickel (Ni) sputtering targets are solid metallic plates or disks used as the source material in physical vapor deposition (PVD). In a vacuum chamber, energetic ions bombard the target surface, ejecting nickel atoms that condense onto a substrate as a thin film. Nickel belongs to the group of transition metals and is valued for its corrosion resistance, ferromagnetic behavior, and good compatibility with many deposition processes.

  • Quantity: 1 piece

Contact AMI Scientific for technical specifications, CoA, or a quotation.

  • Deposition of corrosion-resistant and protective metallic coatings
  • Fabrication of magnetic thin films for recording and sensor research
  • Formation of electrode and contact layers in electronic device prototypes
  • Development of functional and decorative thin-film coatings

Brand —
CAS number —
Molecular formula —
Purity —
Category —
Pack sizes —
Physical form —
Storage —

—

—