This Nickel (Ni) sputtering target from Nanografi is a 99.9% purity disc measuring 1'' in size and 0.125'' in thickness. It serves as the source material for sputter deposition, where atoms are eroded from the target and deposited as a thin film onto a substrate such as a silicon wafer.
Sputtering is an established route for coating substrates of many shapes and sizes. The process is repeatable, works for small research and development projects, and can be scaled to production batches covering medium to large substrate areas.
Depending on process conditions, reactions may take place at the target surface, during transit, or on the substrate. The large number of adjustable parameters makes the technique demanding, but gives experienced users fine control over film growth and microstructure.
- Deposition of thin nickel films onto substrates such as silicon wafers.
- Sputter etching where high etching anisotropy is required and selectivity is not a concern.
- Material analysis by etching, such as secondary ion mass spectroscopy (SIMS) to determine composition and detect trace impurities.
- Research into space weathering processes that alter airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.9% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01NI01
- Material: Nickel (Ni)
- Size: 1''
- Thickness: 0.125''
- Product code: NG0ST01NI01
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