Nickel (Ni) sputtering targets are solid metal plates used as the source material in physical vapor deposition (PVD) sputtering systems. Nickel is a transition metal known for its ferromagnetic behavior, corrosion resistance, and good electrical conductivity. Under bombardment in a vacuum chamber, atoms are ejected from the target and deposited onto a substrate to form thin films with controlled composition and thickness. This product belongs to the nanomaterial category supplied under the Nanografi brand.
- 1 piece
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- Thin-film deposition for magnetic recording and spintronics research
- Electrode and contact layers in electronic and microelectronic device prototyping
- Corrosion-resistant and functional coatings on metal and glass substrates
- Surface and catalysis studies requiring well-defined nickel thin films
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