Nickel (Ni) sputtering targets are solid metallic plates used as the source material in physical vapor deposition (PVD). During sputtering, energetic ions bombard the target surface and eject nickel atoms that condense onto a substrate to form a thin film. Nickel is a transition metal valued for its magnetic, corrosion-resistant, and catalytic properties, which makes its targets a common choice in thin-film research.
- 1 piece
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- Nickel seed and adhesion layers in microelectronics research
- Magnetic thin films for data storage and spintronics studies
- Corrosion-resistant coatings on metal and glass substrates
- Electrode and catalyst layer fabrication for electrochemical research
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