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Nanografi

Nickel (Ni) Sputtering Targets

Nickel (Ni) Sputtering Targets
Regular price Rp 8.241.000,00
Regular price Sale price Rp 8.241.000,00
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Nickel (Ni) sputtering targets are solid metal plates made from nickel, a ferromagnetic transition metal. In physical vapor deposition (PVD), the target is bombarded with energetic ions in a vacuum chamber, which ejects nickel atoms that condense onto a substrate to form a thin film. Nickel targets belong to the metallic sputtering target group used in thin-film research and coating development.

  • Quantity: 1 piece

For technical specifications, Certificate of Analysis (CoA), or a quotation, please contact AMI Scientific.

  • Deposition of magnetic thin films for research on magnetic recording and spintronic devices
  • Corrosion-resistant and protective metallic coatings on laboratory and industrial substrates
  • Seed or adhesion layers for subsequent electroplating or multilayer metal stacks
  • Electrode and contact films for electronic and electrochemical device prototyping

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