Nickel (Ni) sputtering targets are solid metallic sources used in physical vapor deposition (PVD) processes, where energetic ions eject atoms from the target surface to form thin films on substrates. Nickel is a transition metal widely studied for its magnetic, catalytic, and corrosion-resistant behavior, and this product belongs to the metal sputtering target group within the Nanografi nanomaterial range. Targets are typically bonded to backing plates and selected according to the deposition system and research objective.
- Quantity: 1 piece
Contact AMI Scientific for technical specifications, CoA, or a quotation.
- Deposition of metallic thin films for electronic and magnetic device research
- Seed and adhesion layer development in thin-film coating studies
- Catalyst layer preparation for surface chemistry experiments
- Protective and functional coating research
| Brand | — |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | — |
| Category | — |
| Pack sizes | — |
| Physical form | — |
| Storage | — |
—
—