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Nanografi

Nickel (Ni) Sputtering Targets

Nickel (Ni) Sputtering Targets
Regular price Rp 8.628.000,00
Regular price Sale price Rp 8.628.000,00
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Nickel (Ni) sputtering targets are solid metal sources used in physical vapor deposition (PVD). High-energy ions eject nickel atoms from the target surface, which then condense on a substrate to form a thin film. As a transition metal, nickel is valued for its magnetic behavior, corrosion resistance, and electrical conductivity, so it is a common material for thin film research. This product is supplied under the Nanografi brand.

  • Quantity: 1 piece

For technical specifications, certificate of analysis (CoA), or pricing, please contact AMI Scientific.

  • Deposition of nickel seed and adhesion layers in microelectronics research
  • Fabrication of magnetic thin films for data storage and spintronics studies
  • Corrosion-resistant and decorative metal coatings on laboratory substrates
  • Electrode and catalyst layer development for electrochemical research

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