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Nanografi

Nickel (Ni) Sputtering Targets

Nickel (Ni) Sputtering Targets
Regular price Rp 7.467.000,00
Regular price Sale price Rp 7.467.000,00
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Nickel (Ni) sputtering targets are solid metal sources used in physical vapor deposition. High-energy ions bombard the target surface and eject nickel atoms, which condense onto a substrate to form a thin film. As a transition metal, nickel is widely studied in thin-film research because of its magnetic, catalytic, and conductive properties. This product belongs to the metal sputtering target category from the Nanografi range.

  • Quantity: 1 piece

For technical specifications, CoA, or quotation, please contact AMI Scientific.

  • Magnetic thin films for data storage and spintronics research
  • Seed and adhesion layers in microelectronics and electrode development
  • Corrosion-resistant and decorative coating studies
  • Catalytic thin-film model systems in surface science

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