Nickel (Ni) sputtering targets are solid metal plates used as source material in physical vapor deposition (PVD), where atoms are ejected from the target and deposited onto a substrate to form thin films. Nickel is a transition metal, and its sputtering targets belong to the metallic target category used in thin-film research and process development.
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- Deposition of nickel-based thin films for magnetic and spintronic device research
- Fabrication of metallic electrode and contact layers in electronics prototyping
- Development of corrosion-resistant and decorative coatings
- Study of nickel thin films as seed or adhesion layers in multilayer structures
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