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Nickel (Ni) Sputtering Targets

Nickel (Ni) Sputtering Targets
Regular price Rp 15.053.000,00
Regular price Sale price Rp 15.053.000,00
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Nickel (Ni) sputtering targets are solid, dense plates or discs of metallic nickel used as the source material in physical vapor deposition (PVD) sputtering systems. Under ion bombardment, atoms are ejected from the target surface and deposited onto a substrate to form uniform thin films. Nickel belongs to the transition metal group and is known for its magnetic and catalytic properties.

  • Quantity: 1 piece

Contact AMI Scientific for technical specifications, Certificate of Analysis (CoA), or a quotation.

  • Thin-film research on magnetic recording and spintronic layers
  • Electrode and contact layer development in electronic device prototyping
  • Studies of corrosion-resistant and decorative metallic coatings
  • Seed or adhesion layers prior to electroplating processes

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