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Nickel (Ni) Sputtering Targets

Nickel (Ni) Sputtering Targets
Regular price Rp 16.059.000,00
Regular price Sale price Rp 16.059.000,00
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Nickel (Ni) sputtering targets are solid source plates used in physical vapor deposition (PVD) to deposit thin metallic films onto substrates. Nickel is a ferromagnetic transition metal valued for its corrosion resistance, electrical conductivity, and magnetic behavior, which makes it a common choice for thin-film research and development.

  • Quantity: 1 piece

Contact AMI Scientific for technical specifications, CoA, or a quotation.

  • Deposition of nickel seed and adhesion layers in microelectronics research
  • Magnetic thin films for data storage and spintronics studies
  • Development of corrosion-resistant and decorative coatings
  • Electrode and catalyst film preparation in energy research

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