Nickel (Ni) sputtering targets are solid metal plates used as the source material in physical vapor deposition (PVD) sputtering systems. Nickel is a ferromagnetic transition metal valued for its corrosion resistance, magnetic behavior, and electrical conductivity. During sputtering, energetic ions eject nickel atoms from the target surface, which then condense on a substrate to form a uniform thin film.
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- Thin-film deposition for magnetic recording and spintronics research
- Corrosion-resistant and functional metallic coatings
- Electrode, seed, and adhesion layers in microelectronics research
- Fabrication of nickel-based thin films for catalysis and sensor studies
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