Nickel (Ni) sputtering targets are solid nickel plates used as source material in physical vapor deposition (PVD) sputtering systems. Nickel is a transition metal, and sputtering targets of this type are used to deposit uniform metallic thin films onto substrates. Its metallic properties make it a common choice for research on ferromagnetic and catalytic films. Nanografi nickel sputtering targets are supplied by AMI Scientific for laboratory and pilot-scale use.
- Quantity: 1 piece
Contact AMI Scientific for technical specifications, CoA, or a quotation. Our team can assist with selecting the right target for your sputtering system.
- Deposition of nickel thin films for magnetic and electronic device research
- Seed and adhesion layers in thin-film fabrication
- Protective and decorative coating studies
- Electrode and catalyst layer development
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