Nickel oxide (NiO) is an inorganic metal oxide and a p-type semiconductor from the transition metal oxide group. This product is a sputtering target, a solid source material used in physical vapor deposition (PVD) to form thin films on substrates. The product title also references indium, so please confirm the exact composition or bonding configuration with our team before ordering.
- Quantity: 1 piece
Contact AMI Scientific for technical specifications, Certificate of Analysis (CoA), or a quotation.
- Deposition of p-type oxide layers for thin-film electronics research
- Hole-transport and transparent conductive layers for photovoltaic and display studies
- Resistive switching layers for non-volatile memory device research
- Electrochromic and gas-sensing coating development
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