Nickel Oxide (NiO) sputtering targets are ceramic source materials in the metal oxide class, used in physical vapor deposition (PVD) to form thin films. Nickel oxide is a wide-bandgap p-type semiconductor that is widely studied in functional thin-film research. The target serves as a solid source for sputtering in compatible deposition systems. The product listing also references indium.
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- Hole transport layers in perovskite and organic photovoltaic research
- Electrochromic and transparent conductive oxide film studies
- Resistive switching memory device development
- Functional and protective thin-film coating research
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