Nickel oxide (NiO) is a transition metal oxide widely studied as a p-type semiconductor. This product is supplied as a sputtering target, a solid source material used in physical vapor deposition (PVD) to form NiO thin films on substrates for research and device prototyping. The product title also references indium; please contact us to confirm the exact target composition and any bonding or backing details.
- Quantity: 1 piece
For technical specifications, certificate of analysis (CoA), or a quotation, please contact AMI Scientific.
- Deposition of p-type NiO thin films for oxide electronics research
- Hole transport and charge extraction layers in organic and perovskite solar cell studies
- Electrochromic and smart window coating development
- Resistive switching layers for non-volatile memory device research
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