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Nickel Oxide (NiO) Sputtering Targets

Nickel Oxide (NiO) Sputtering Targets
Regular price Rp 21.439.000,00
Regular price Sale price Rp 21.439.000,00
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Nickel oxide (NiO) is an inorganic metal oxide ceramic from the transition metal oxide group. Sputtering targets are dense, solid source materials used in physical vapor deposition (PVD), where bombardment with energetic ions ejects atoms from the target surface so they condense onto a substrate as a thin film.

  • Quantity: 1 piece

For technical specifications, certificates of analysis, or quotations, please contact AMI Scientific.

  • Deposition of p-type transparent conductive and semiconducting thin films for electronic research
  • Hole transport layers in organic and perovskite photovoltaic device studies
  • Resistive switching layers for memory device development
  • Electrochromic and gas sensing thin film research

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