This nickel oxide (NiO) sputtering target from Nanografi is a 99.9% purity disc measuring 1'' across and 0.125'' thick. It serves as the source material in sputter deposition, where material is eroded from the target and deposited as a thin film onto a substrate such as a silicon wafer.
Sputtering is an established method for coating substrates of many shapes and sizes. The process is repeatable, and work started at research and development scale can be scaled up to production batches covering medium to large substrate areas.
Depending on process parameters, chemical reactions may take place at the target surface, in flight or on the substrate. The number of adjustable parameters makes sputter deposition complex, but it gives experienced users considerable control over film growth and microstructure.
- Deposition of nickel oxide thin films onto substrates such as silicon wafers.
- Sputter etching where highly anisotropic etching is required and selectivity is not critical.
- Analytical work such as secondary ion mass spectrometry (SIMS), where material is sputtered at a constant rate and the ejected atoms are identified by mass spectrometry.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.9% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01NI59
- Material: Nickel Oxide (NiO)
- Size: 1''
- Thickness: 0.125''
- Product code: NG0ST01NI59
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