This nickel oxide (NiO) sputtering target from Nanografi is a 1'' disc with a thickness of 0.125'' and a purity of 99.995%. It serves as the source material for depositing NiO thin films in sputtering systems, and is supplied as a single piece.
In sputter deposition, material is eroded from the target and carried onto a substrate such as a silicon wafer. The technique works on many substrate shapes and sizes, gives repeatable results, and can move from small research and development work to production batches covering medium to large substrate areas.
Depending on the process parameters, chemical reactions may take place at the target surface, in flight or on the substrate. Although these many variables make sputtering a complex process, they give experienced users fine control over film growth and microstructure.
- Deposition of nickel oxide thin films onto substrates such as silicon wafers.
- Sputter etching where high etching anisotropy is required and selectivity is not a concern.
- Analytical work such as secondary ion mass spectrometry (SIMS), where sputtered atoms are measured to determine composition and detect very low impurity levels.
- Scaling thin film processes from research and development to medium and large substrate production batches.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.995% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01NI60
- Material: Nickel Oxide (NiO)
- Size: 1''
- Thickness: 0.125''
- Product code: NG0ST01NI60
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