Nickel Oxide (NiO) sputtering targets are solid, dense ceramic sources of nickel oxide used in physical vapor deposition (PVD). NiO is an inorganic transition metal oxide, widely studied as a p-type semiconductor and functional thin film material. Sputtering targets enable controlled deposition of NiO films onto substrates for research and device prototyping.
- Quantity: 1 piece
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- Hole transport layers in organic and perovskite optoelectronic devices
- Electrochromic and smart window coatings
- Resistive switching layers for memory device research
- Gas sensing thin films
- Functional oxide layers in catalysis and energy research
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