Nickel Oxide (NiO) sputtering targets are ceramic source materials used in physical vapor deposition to form thin films. NiO is a transition metal oxide and is widely studied as a p-type wide-bandgap semiconductor. Sputtering targets of this type are used to deposit uniform oxide layers for research and development in electronics, energy, and coating technologies.
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- Hole-transport and p-type layers in thin-film solar cells and perovskite or organic photovoltaic devices
- Electrochromic coatings for smart windows and display research
- Gas sensor films for detecting reducing and oxidizing gases
- Resistive switching layers for non-volatile memory device studies
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