Nickel oxide (NiO) is an inorganic transition metal oxide, widely studied as a p-type semiconductor with a wide band gap. Supplied as a sputtering target, it serves as the source material in physical vapor deposition (PVD) to produce NiO thin films for research and device prototyping. It belongs to the nanomaterial and advanced thin-film material group.
- 1 piece
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- Deposition of electrochromic coatings and smart-window research layers
- Hole transport or p-type layers in perovskite and organic solar cell studies
- Resistive switching layers for non-volatile memory (RRAM) research
- Sensing films for gas and humidity sensor development
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