This Nanografi nickel oxide (NiO) sputtering target is a 99.98% purity disc measuring 2'' across and 0.125'' thick, supplied as a single piece. It serves as the source material for depositing NiO thin films by sputtering onto substrates such as silicon wafers.
Sputter deposition works on substrates of many shapes and sizes and gives repeatable results. A process developed in small research projects can be scaled up to production batches covering medium to large substrate areas. Depending on process settings, chemical reactions may take place on the target surface, in flight or on the substrate. The number of adjustable parameters makes the technique complex, but it also gives experienced users fine control over film growth and microstructure.
- Deposition of nickel oxide thin films onto substrates such as silicon wafers.
- Sputter etching where strongly anisotropic etching is required and selectivity is not critical.
- Analytical work such as secondary ion mass spectrometry (SIMS), where material is sputtered at a constant rate to measure composition and trace impurities.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.98% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01NI63
- Material: Nickel Oxide (NiO)
- Size: 2''
- Thickness: 0.125''
- Product code: NG0ST01NI63
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