Nickel Oxide (NiO) sputtering targets are ceramic source materials used in physical vapor deposition to form thin films of nickel oxide. NiO is a transition metal oxide in the metal oxide semiconductor family, valued in thin-film form for its wide bandgap and p-type conduction behavior.
- Quantity: 1 piece
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- Hole transport layers in perovskite and organic photovoltaic device research
- Transparent p-type conducting films for optoelectronic studies
- Resistive switching layers in memory device development
- Electrochromic and gas sensing thin-film research
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