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Nickel Oxide (NiO) Sputtering Targets

Nickel Oxide (NiO) Sputtering Targets
Regular price Rp 33.824.000,00
Regular price Sale price Rp 33.824.000,00
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Nickel oxide (NiO) is an inorganic ceramic compound of nickel and oxygen, classified as a transition metal oxide with semiconducting properties. Sputtering targets are solid, dense plates used in physical vapor deposition (PVD) to deposit thin films of this material onto substrates for research and industrial development.

  • Quantity: 1 piece

Contact AMI Scientific for technical specifications, Certificate of Analysis (CoA), or a quotation.

  • Hole transport layers in perovskite and organic photovoltaic devices
  • Resistive switching layers in non-volatile memory research
  • Electrochromic and transparent functional coatings
  • Thin-film gas sensing structures

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