Nickel vanadium (NiV) sputtering target is a metallic alloy target composed of nickel and vanadium. It serves as the source material in physical vapor deposition (PVD) sputtering processes, where atoms are ejected from the target surface and deposited onto a substrate to form thin films. It belongs to the group of metal alloy sputtering targets used in nanomaterial and thin-film research.
- Quantity: 1 piece
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- Deposition of metallic thin films for microelectronics and device research
- Studies of magnetic thin-film structures and their properties
- Development of functional and corrosion-resistant metallic coatings
- Fabrication of multilayer stacks and adhesion or seed layers in experimental devices
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