Nickel Vanadium (NiV) sputtering targets are solid metal alloy sources made from a nickel and vanadium composition, designed for physical vapor deposition (PVD) processes. Classified as metallic alloy sputtering targets within the nanomaterial category, they are used to deposit uniform thin films onto substrates in a vacuum chamber, offering a controlled and reproducible source for research and development work.
- Quantity: 1 piece
For technical specifications, certificate of analysis (CoA), or quotation, please contact AMI Scientific.
- Thin-film metallization research for electronic and semiconductor device prototypes
- Development of diffusion barrier and adhesion layers in multilayer coating stacks
- Functional and protective coating studies on metallic and ceramic substrates
- Magnetic and catalytic thin-film research in university and industrial laboratories
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