Nickel Vanadium (NiV) sputtering targets are solid source materials made from a nickel-vanadium metal alloy. In physical vapor deposition (PVD), the target is bombarded with energetic ions so that its atoms are ejected and deposited onto a substrate, forming a uniform thin film. Metal alloy targets like NiV belong to the class of functional sputtering materials used in advanced thin-film research and coating processes.
- Quantity: 1 piece
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- Deposition of metallic alloy thin films for electronic and microelectronic device research
- Development of functional coatings for surface engineering studies
- Fabrication of thin-film layers for magnetic and spintronic material investigations
- Process development and optimization in university and industrial PVD laboratories
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