Nickel Vanadium (NiV) sputtering targets are metal alloy targets composed of nickel and vanadium. They are used in physical vapor deposition (PVD), particularly magnetron sputtering, to deposit thin films onto substrates. As a metallic alloy source, the target material is eroded by ion bombardment, and the sputtered atoms condense on a substrate to form a uniform coating. The material falls within the broader category of metal alloy sputtering targets used in thin-film research and development.
- Quantity: 1 piece
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- Thin-film deposition for metallization layers in electronic and semiconductor device research
- Fabrication of magnetic thin films for studies in spintronics and magnetic storage
- Development of functional and corrosion-resistant coatings on laboratory substrates
- Preparation of alloy films for catalysis and surface science experiments
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