Nickel Vanadium (NiV) sputtering targets are solid metal alloy targets composed of nickel and vanadium, designed for use in physical vapor deposition (PVD) sputtering systems. During sputtering, energetic ions bombard the target surface, ejecting atoms that condense onto a substrate to form a thin film. NiV alloy targets belong to the metallic alloy target category and are widely used in thin-film research and development.
- 1 piece
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- Thin-film deposition for electronic and microelectronic device research
- Development of magnetic thin films and spintronic structures
- Studies of corrosion-resistant and protective metallic coatings
- Electrode and contact layer fabrication in laboratory prototypes
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